An in-depth look at the state of the art of in situ real-time monitoring and
analysis of thin films With thin film deposition becoming increasingly critical
in the production of advanced electronic and optical devices, scientists and
engineers working in this area are looking for in situ, real-time,
structure-specific analytical tools for characterizing phenomena occurring at
surfaces and interfaces during thin film growth. This volume brings together
contributed chapters from experts in the field, covering proven methods for in
situ real-time analysis of technologically important materials such as
multicomponent oxides in different environments. Background information and
extensive references to the current literature are also provided. Readers will
gain a