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Book Summary
Discover innovative tools that pave the way from circuit and physical design to
fabrication processingNano-CMOS Design for Manufacturability examines the
challenges that design engineers face in the nano-scaled era, such as
exacerbated effects and the proven design for manufacturability (DFM)
methodology in the midst of increasing variability and design process
interactions. In addition to discussing the difficulties brought on by the
continued dimensional scaling in conformance with Moore's law, the authors also
tackle complex issues in the design process to overcome the difficulties,
including the use of a functional first silicon to support a predictable product
ramp. Moreover, they introduce several emerging concepts, including stress
proximity effects, contour-based extraction,
Discover innovative tools that pave the way from circuit and physical design to
fabrication processingNano-CMOS Design for Manufacturability examines the
challenges that design engineers face in the nano-scaled era, such as
exacerbated effects and the proven design for manufacturability (DFM)
methodology in the midst of increasing variability and design process
interactions. In addition to discussing the difficulties brought on by the
continued dimensional scaling in conformance with Moore's law, the authors also
tackle complex issues in the design process to overcome the difficulties,
including the use of a functional first silicon to support a predictable product
ramp. Moreover, they introduce several emerging concepts, including stress
proximity effects, contour-based extraction,