DEGREESIGeSi Strained Layers and Their Applications provides a ready reference
of seminal research papers in this technology for the practising researcher in
electronic engineering and materials science.
Silicon technology has dominated the field of microelectronics for the last
twenty years. It is the major technology underlying commerical device
applications. GeSi strained-layer heterostructure device technology has expanded
the range of applications and reinforced the position of silicon as a leading
edge material in the microelectronic arena.
This book presents key papers on the following topics:
* growth, nucleation, mechanical structure and stability
* band structure, mobility, and optical properties
* applications
for GeSi strained-layer heterostructure device technology.
The Editors describe the research